Seulgi Han†, Byung Woo Hwang†, Eun Young Jeon‡, Dooyup Jung‡, Geon Hui Lee†, Do Hee Keum†, Ki Su Kim*§⊥∥, Seok Hyun Yun⊥, Hyung Joon Cha‡, and Sei Kwang Hahn*†§
† Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang, Gyeongbuk 37673, Korea
‡ Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang, Gyeongbuk 37673, Korea
§ PHI BIOMED Co., #613, 12 Gangnam-daero 65-gil, Seocho-gu, Seoul 06612, Korea
⊥ Wellman Center for Photomedicine, Harvard Medical School and Massachusetts General Hospital, 65 Landsdowne Street UP-5, Cambridge, Massachusetts 02139, United States
*Corresponding Authors
Present Address
∥Department of Organic Materials Science and Engineering, School of Engineering, Pusan National University, 2 Busandaehak-ro 63 beon-gil, Geunjeong, Busan, 46241, Korea.